Petrografinen mikroskopointi on nopea tapa selvittää näytteen mineraalikoostumusta, näytteen alkuperäistä ympäristöä sekä geologista evoluutiota. Polarisaatiomikroskoopilla voidaan myös analysoida metamorfoosin ja deformaation aiheuttamia rakenteita näytteistä.
(EAG) multiple XRD systems are X-ray Diffraction, XRD Analysisequipped with optical modules that can be exchanged, depending on the analysis requirement, without affecting the accuracy of positioning. It is simple to change between line and point focus of the x-ray tube, enabling simple switching from a regular XRD configuration to a high-resolution XRD configuration. Different combinations of optical modules enable the analysis of powders, coatings, thin films, slurries, fabricated parts, or epitaxial films.
Main Applications of XRD Analysis
XRD sovellukset
- Faasitunnistus, mineraalit ja kiteiset aineet
- Faasien määräsuhteet useampaa faasia sisältävästä näytteestä (Rietweld-analyysi)
- 1-kiteisen aineen orientaation selvittäminen
Tyypillisiä näytteitä
- Prosessituotteet kaivosteollisuudesta
- rakosavet tunnelirakentamisessa, erityisesti paisuvahilaisten savimineraalien määräosuudet
- mineraalien identifiointi
- mineraalien määräsuhteet useampaa faasia sisältävistä näytteistä
- asbestit
- Phase identification for a large variety of bulk and thin-film samples
- Detecting crystalline minority phases (at concentrations greater than ~1%)
- Determining crystallite size for polycrystalline films and materials
- Determining percentage of material in crystalline form versus amorphous
- Measuring sub-milligram loose powder or dried solution samples for phase identification
- Analyzing films as thin as 50 angstroms for texture and phase behaviors
- Determining strain and composition in epitaxial thin films
- Determining surface offcut in single crystal materials
- Measuring residual stress in bulk metals and ceramics
- Signal Detected: Diffracted x-rays
- Elements Detected: All elements, assuming they are present in a crystalline matrix
- Detection Limits: Quantitative multiphase analysis: ~1%
- External standard quantitative analysis: ~0.1%
- Special quantitative analysis (quartz, polymorphs): ~0.02%
- Minimum film thickness for phase identification: ~20 Angstroms
- Depth Resolution: Adjustable sampling depth between ~20 Angstroms to ~30 microns, depending on material properties and x-ray incidence angles
- Imaging/Mapping: None
- Lateral Resolution/Probe Size: Point focus: 0.1mm to 0.5mm; Line focus 2mm to 12 mm
- Aerospace
- Automotive
- Medical Implants
- Compound Semiconductor
- Data Storage
- Displays
- Electronics
- Industrial Products
- Lighting
- Pharmaceutical
- Photonics
- Polymer
- Semiconductor
- Solar Photovoltaics
- Nondestructive
- Quantitative measurement of phase contents and texture orientation
- Minimal or no sample preparation requirements
- Ambient conditions for all analysis
- Cannot identify amorphous materials
- No depth profile information
- Minimum spot size of ~50um